Canon kabushiki kaisha (20240336003). IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract

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IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE

Organization Name

canon kabushiki kaisha

Inventor(s)

NAOKI Murasato of Tochigi (JP)

IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240336003 titled 'IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE

Simplified Explanation: The patent application describes an imprint apparatus that corrects the shape of a mold using contact portions, detects contact states, and stabilizes the mold position during imprint processing.

  • The imprint apparatus corrects the shape of the mold using contact portions that apply force to the side surfaces of the mold.
  • A detection unit monitors the contact states of the contact portions.
  • A control unit adjusts the drive timings of the contact portions to stabilize the mold position during imprint processing.

Key Features and Innovation:

  • Shape correction mechanism for molds using contact portions.
  • Detection unit for monitoring contact states.
  • Control unit for stabilizing mold position by adjusting drive timings.

Potential Applications: The technology can be used in semiconductor manufacturing, nanotechnology, and microfabrication processes.

Problems Solved: The technology addresses issues related to mold shape accuracy and stability during imprint processing.

Benefits:

  • Improved mold shape accuracy.
  • Enhanced stability during imprint processing.
  • Increased efficiency in manufacturing processes.

Commercial Applications: Imprint apparatus for semiconductor manufacturing and microfabrication processes.

Prior Art: Readers can explore prior art related to imprint processing, mold correction mechanisms, and semiconductor manufacturing technologies.

Frequently Updated Research: Stay updated on advancements in imprint processing, mold correction technologies, and semiconductor manufacturing processes.

Questions about imprint apparatus: 1. How does the imprint apparatus improve mold shape accuracy? 2. What are the potential commercial applications of this technology?


Original Abstract Submitted

an imprint apparatus performing imprint processing for molding an imprint material on a substrate using a mold includes a shape correction mechanism configured to correct a shape of the mold using a plurality of contact portions for applying a force to side surfaces of the mold, a detection unit configured to detect contact states of the plurality of contact portions, and a control unit configured to perform a stabilizing operation of moving the mold toward a stable position by adjusting drive timings of the plurality of contact portions in accordance with an output of the detection unit.