Taiwan semiconductor manufacturing company, ltd. (20240339544). LIGHTLY-DOPED CHANNEL EXTENSIONS simplified abstract
Contents
LIGHTLY-DOPED CHANNEL EXTENSIONS
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Wei-Jen Lai of Keelung City (TW)
Wei-Yuan Lu of Taipei City (TW)
Chih-Hao Yu of Tainan City (TW)
Chia-Pin Lin of Hsinchu County (TW)
LIGHTLY-DOPED CHANNEL EXTENSIONS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240339544 titled 'LIGHTLY-DOPED CHANNEL EXTENSIONS
The abstract of the patent application describes a semiconductor structure with various components such as channel members, channel extension features, and inner spacer features.
- The semiconductor structure includes a first channel member and a second channel member placed over the first channel member.
- It also consists of first and second channel extension features connected to the respective channel members.
- An inner spacer feature is positioned between the first and second channel extension features.
Potential Applications: - This technology could be used in the development of advanced semiconductor devices. - It may find applications in the manufacturing of high-performance electronic components.
Problems Solved: - The semiconductor structure addresses the need for improved performance and efficiency in semiconductor devices. - It helps in enhancing the functionality of electronic systems.
Benefits: - Increased efficiency and performance in semiconductor devices. - Enhanced functionality and reliability of electronic components.
Commercial Applications: Title: Advanced Semiconductor Structures for Enhanced Performance This technology could be utilized in the production of cutting-edge electronic devices, leading to improved performance and reliability in various industries such as telecommunications, computing, and consumer electronics.
Questions about Semiconductor Structures: 1. How does the inner spacer feature contribute to the overall performance of the semiconductor structure?
The inner spacer feature helps in maintaining the alignment and stability of the channel extension features, thereby improving the functionality of the semiconductor structure.
2. What are the potential challenges in implementing this semiconductor structure in commercial electronic devices?
The main challenges could include manufacturing complexities and cost considerations, which may need to be addressed for widespread adoption of this technology.
Original Abstract Submitted
a semiconductor structure and a method of forming the same are provided. a semiconductor structure according to the present disclosure includes a first channel member and a second channel member disposed over the first channel member, a first channel extension feature coupled to the first channel member, a second channel extension feature coupled to the second channel member, and an inner spacer feature disposed between the first channel extension feature and the second channel extension feature.
