Samsung electronics co., ltd. (20240337928). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN simplified abstract

ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN

Organization Name

samsung electronics co., ltd.

Inventor(s)

Hana Kim of Suwon-si (KR)

Haengdeog Koh of Suwon-si (KR)

Hyeran Kim of Suwon-si (KR)

Youngmin Nam of Suwon-si (KR)

Giyoung Song of Hwaseong-si (KR)

Changheon Lee of Suwon-si (KR)

Aram Jeon of Suwon-si (KR)

Jungha Chae of Suwon-si (KR)

Songse Yi of Hwaseong-si (KR)

Sukkoo Hong of Hwaseong-si (KR)

ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240337928 titled 'ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN

The abstract describes an organic salt represented by formula 1, a photoresist composition containing the salt, and a method for creating a pattern using the composition.

• Simplified Explanation:

An organic salt and photoresist composition are disclosed in the patent application, along with a method for forming patterns using the composition.

• Key Features and Innovation:

- Organic salt represented by formula 1 - Photoresist composition incorporating the organic salt - Method for forming patterns using the composition

• Potential Applications:

- Semiconductor manufacturing - Microelectronics industry - Photolithography processes

• Problems Solved:

- Improving pattern formation in photoresist materials - Enhancing resolution and accuracy in semiconductor manufacturing

• Benefits:

- Higher quality patterns - Increased efficiency in manufacturing processes - Cost-effective solution for pattern formation

• Commercial Applications:

"Organic Salt-Based Photoresist Composition for Semiconductor Manufacturing and Microelectronics Industry"

• Questions about the Technology:

1. How does the organic salt improve pattern formation in photoresist materials? 2. What are the advantages of using this photoresist composition in semiconductor manufacturing?

Original Abstract Submitted

provided are an organic salt represented by formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition.