Taiwan semiconductor manufacturing co., ltd. (20240330563). SYSTEM AND METHOD FOR DIAGNOSING DESIGN RULE CHECK VIOLATIONS simplified abstract
Contents
SYSTEM AND METHOD FOR DIAGNOSING DESIGN RULE CHECK VIOLATIONS
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
SYSTEM AND METHOD FOR DIAGNOSING DESIGN RULE CHECK VIOLATIONS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240330563 titled 'SYSTEM AND METHOD FOR DIAGNOSING DESIGN RULE CHECK VIOLATIONS
The abstract describes a system and method for fixing design rule check (DRC) violations in layout patterns by determining if a layout pattern is an inlier based on a comparison with previously analyzed patterns, selecting a recipe from a pool of recipes for fixing the violation, and applying it to the layout clip.
- The system uses anomaly detection algorithms to compare layout patterns and identify inliers.
- Recipes are selected from a pool of previously applied solutions to fix DRC violations.
- The method aims to automate the process of identifying and fixing DRC violations in layout patterns efficiently.
Potential Applications: - Semiconductor manufacturing - Electronic design automation - Quality control in layout design processes
Problems Solved: - Streamlining the process of fixing DRC violations in layout patterns - Improving efficiency and accuracy in layout design processes
Benefits: - Reducing manual effort in identifying and fixing DRC violations - Enhancing the quality and reliability of layout designs - Increasing productivity in semiconductor manufacturing processes
Commercial Applications: Title: Automated DRC Violation Fixing System for Semiconductor Manufacturing This technology can be utilized by semiconductor companies to improve the efficiency and accuracy of layout design processes, leading to cost savings and enhanced product quality. The market implications include increased competitiveness and faster time-to-market for semiconductor products.
Prior Art: Researchers in the field of electronic design automation have explored various methods for automating DRC violation fixing in layout patterns. Prior studies have focused on anomaly detection algorithms and recipe-based solutions for addressing DRC violations in semiconductor manufacturing processes.
Frequently Updated Research: Researchers are continuously working on enhancing anomaly detection algorithms and developing new recipes for fixing DRC violations in layout patterns. Stay updated on the latest advancements in electronic design automation to leverage cutting-edge solutions for layout design processes.
Questions about DRC Violation Fixing System: 1. How does the system determine if a layout pattern is an inlier? The system compares the layout pattern with previously analyzed patterns using anomaly detection algorithms to identify inliers. 2. What are the potential applications of this technology beyond semiconductor manufacturing? This technology can also be applied in industries such as printed circuit board design and integrated circuit manufacturing for improving layout design processes.
Original Abstract Submitted
a system and method for fixing drc violations includes receiving a layout pattern having a design rule check (drc) violation therein, determining that the layout pattern is an inlier based upon a comparison of the layout pattern with a plurality of previously analyzed layout patterns. the comparison may be performed by an anomaly detection algorithm. the system and method may also include selecting a recipe from a pool of recipes previously applied to the plurality of previously analyzed layout patterns for fixing the drc violation in the layout clip upon determining that the layout pattern is an inlier.
