Taiwan semiconductor manufacturing co., ltd. (20240329517). PELLICLE HAVING VENT HOLE simplified abstract

PELLICLE HAVING VENT HOLE

Organization Name

taiwan semiconductor manufacturing co., ltd.

Inventor(s)

Chue San Yoo of Hsinchu (TW)

Chih-Chiang Tu of Hsinchu (TW)

Chien-Cheng Chen of Hsinchu (TW)

Jong-Yuh Chang of Hsinchu (TW)

Kun-Lung Hsieh of Hsinchu (TW)

Pei-Cheng Hsu of Hsinchu (TW)

Hsin-Chang Lee of Hsinchu (TW)

Yun-Yue Lin of Hsinchu (TW)

PELLICLE HAVING VENT HOLE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240329517 titled 'PELLICLE HAVING VENT HOLE

The abstract describes a pellicle for a photomask, consisting of a frame with a vent hole covered by a filter that contacts the inner surface of the frame. Additionally, the pellicle includes a membrane extending over the frame's top surface.

• Frame with vent hole and filter:

   - The frame of the pellicle has a vent hole for ventilation purposes.
   - A filter covers the vent hole and directly contacts the inner surface of the frame.

• Membrane extension:

   - A membrane extends over the top surface of the frame to provide additional protection.

Potential Applications: - Used in semiconductor manufacturing processes to protect photomasks from contaminants. - Can be utilized in cleanroom environments to maintain the integrity of photomasks during lithography processes.

Problems Solved: - Prevents particles and contaminants from reaching the photomask surface. - Ensures proper ventilation to maintain the quality of the photomask.

Benefits: - Enhances the longevity and performance of photomasks. - Improves the quality and accuracy of semiconductor manufacturing processes.

Commercial Applications: Title: "Advanced Pellicle Technology for Photomask Protection" This technology can be commercialized for use in semiconductor fabrication facilities, cleanroom environments, and photolithography processes. It can benefit companies involved in the production of microelectronics, integrated circuits, and other semiconductor devices.

Questions about Pellicle Technology: 1. How does the filter on the vent hole of the pellicle improve the performance of photomasks?

  - The filter prevents contaminants from entering the photomask, ensuring its quality and longevity.

2. What are the potential cost savings associated with using pellicles in semiconductor manufacturing processes?

  - By protecting photomasks from damage, pellicles can reduce the need for frequent replacements and maintenance, leading to cost savings in the long run.

Original Abstract Submitted

a pellicle includes a frame having an attachment surface configured to attach to a photomask, wherein the frame comprises a vent hole. the pellicle further includes a filter covering the vent hole, wherein the filter directly contacts an inner surface of the frame, and the filter extends in a direction parallel to the attachment surface. the pellicle further includes a membrane extending over a top surface of the frame.