Betone Technology Shanghai, Inc. (20240327986). CHEMICAL VAPOR DEPOSITION DEVICE CAPABLE OF RECIPROCATING ROTATION AND LIFTING simplified abstract
Contents
CHEMICAL VAPOR DEPOSITION DEVICE CAPABLE OF RECIPROCATING ROTATION AND LIFTING
Organization Name
Betone Technology Shanghai, Inc.
Inventor(s)
Xiaoliang Jin of Shanghai (CN)
CHEMICAL VAPOR DEPOSITION DEVICE CAPABLE OF RECIPROCATING ROTATION AND LIFTING - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240327986 titled 'CHEMICAL VAPOR DEPOSITION DEVICE CAPABLE OF RECIPROCATING ROTATION AND LIFTING
The abstract describes a chemical vapor deposition device that can reciprocate rotation and lifting. It utilizes magnetic-fluid sealing for device sealing and integrates rotation and lifting functions effectively.
- Magnetic-fluid sealing principle used for device sealing
- Integration of rotation and lifting functions
- Avoids physical entanglement and damage of electrical wires during rotation
- Micro-particles in the cavity do not affect the rotation mechanism
- Fewer transmission components reduce instability and mechanical wear
- Improved accuracy and stability of lifting and rotation control
- Reduced manufacturing costs and power consumption
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Solar cell production
Problems Solved: - Physical entanglement and damage of electrical wires during rotation - Micro-particles affecting the rotation mechanism - Instability and mechanical wear caused by redundant components
Benefits: - Efficient and stable operation - Improved accuracy and stability - Cost-effective manufacturing - Reduced power consumption
Commercial Applications: Title: Advanced Chemical Vapor Deposition Device for Semiconductor Manufacturing This technology can be used in semiconductor manufacturing facilities to enhance thin film deposition processes, leading to improved efficiency and cost savings.
Prior Art: Prior art related to this technology can be found in patents and research papers on chemical vapor deposition devices, magnetic-fluid sealing principles, and integrated rotation and lifting mechanisms.
Frequently Updated Research: Researchers are constantly exploring new materials and methods to enhance chemical vapor deposition processes, including advancements in magnetic-fluid sealing technology and integrated device functionalities.
Questions about Chemical Vapor Deposition Devices: 1. How does magnetic-fluid sealing improve device sealing in chemical vapor deposition devices? Magnetic-fluid sealing uses magnetic particles to create a seal, preventing leaks and ensuring device integrity.
2. What are the key benefits of integrating rotation and lifting functions in a chemical vapor deposition device? Integrating rotation and lifting functions allows for coordinated movement, enhancing the efficiency and stability of the deposition process.
Original Abstract Submitted
a chemical vapor deposition device capable of reciprocating rotation and lifting is provided. the chemical vapor deposition device includes a cavity, a base, a fixing bracket, a lifting mechanism, and a rotation mechanism. the present disclosure utilizes the principle of magnetic-fluid sealing to achieve device sealing and integrates the rotation and lifting functions, satisfying the coordinated work of reciprocating rotation, lifting movement, wafer heating, etc. at the same time without affecting each other. moreover, the problem of physical entanglement and damage of electrical wires during the rotation process has been avoided, and micro-particles formed in the cavity will not affect the rotation mechanism, thereby enabling the efficient and stable operation of the rotation mechanism. the present disclosure has fewer transmission components, which reduces instability and mechanical wear caused by redundant components, improves the accuracy and stability of lifting and rotation control, and minimizes manufacturing costs and power consumption.
