Samsung electronics co., ltd. (20240327338). ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract

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ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Aram Jeon of Suwon-si (KR)

Hana Kim of Suwon-si (KR)

Beomseok Kim of Suwon-si (KR)

Hoyoon Park of Suwon-si (KR)

Kyuhyun Im of Suwon-si (KR)

Jinwon Jeon of Suwon-si (KR)

Sungwon Choi of Suwon-si (KR)

ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240327338 titled 'ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME

Simplified Explanation:

The patent application discusses an organic salt represented by formula 1, a resist composition containing the same, and a method of forming a pattern using it.

Key Features and Innovation:

  • Introduction of an organic salt represented by formula 1.
  • Inclusion of this organic salt in a resist composition.
  • Method for forming a pattern utilizing the organic salt.

Potential Applications: The technology can be used in semiconductor manufacturing, photolithography, and other industries requiring precise patterning.

Problems Solved: The technology addresses the need for improved resist compositions for creating intricate patterns in manufacturing processes.

Benefits:

  • Enhanced precision in pattern formation.
  • Increased efficiency in manufacturing processes.
  • Potential cost savings in production.

Commercial Applications: The technology could be applied in the semiconductor industry, display manufacturing, and other high-tech sectors requiring advanced patterning techniques.

Questions about the Technology: 1. How does the organic salt represented by formula 1 improve resist compositions? 2. What specific industries can benefit the most from this technology?

Frequently Updated Research: Stay informed about the latest advancements in resist compositions and patterning techniques to maximize the potential of this technology.


Original Abstract Submitted

provided are an organic salt represented by formula 1, a resist composition including the same, and a method of forming a pattern by using the same:

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