18734875. GLASS SUBSTRATE FOR HIGH-FREQUENCY DEVICE AND CIRCUIT BOARD FOR HIGH-FREQUENCY DEVICE simplified abstract (AGC Inc.)

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GLASS SUBSTRATE FOR HIGH-FREQUENCY DEVICE AND CIRCUIT BOARD FOR HIGH-FREQUENCY DEVICE

Organization Name

AGC Inc.

Inventor(s)

Kazutaka Ono of Tokyo (JP)

Shuhei Nomura of Tokyo (JP)

Nobutaka Kidera of Tokyo (JP)

Nobuhiko Takeshita of Tokyo (JP)

GLASS SUBSTRATE FOR HIGH-FREQUENCY DEVICE AND CIRCUIT BOARD FOR HIGH-FREQUENCY DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18734875 titled 'GLASS SUBSTRATE FOR HIGH-FREQUENCY DEVICE AND CIRCUIT BOARD FOR HIGH-FREQUENCY DEVICE

Simplified Explanation

The patent application describes a glass substrate for high-frequency devices with specific oxide compositions and surface characteristics.

  • The glass substrate contains varying mole percentages of SiO, AlO, BO, MgO, and CaO, with limited alkali metal oxide content.
  • The main surface of the glass substrate has a very low surface roughness and a low dielectric dissipation factor at 35 GHz.

Key Features and Innovation

  • Specific oxide composition of the glass substrate.
  • Surface roughness of 1.5 nm or less.
  • Low dielectric dissipation factor at 35 GHz.

Potential Applications

The glass substrate can be used in high-frequency devices such as antennas, sensors, and communication systems.

Problems Solved

  • Provides a stable and reliable substrate for high-frequency applications.
  • Ensures low signal loss and interference.

Benefits

  • Improved performance of high-frequency devices.
  • Enhanced signal transmission efficiency.
  • Increased reliability and stability.

Commercial Applications

  • Antennas for telecommunications.
  • Radar systems.
  • Wireless communication devices.

Questions about Glass Substrate for High-Frequency Devices

What are the key features of the glass substrate described in the patent application?

The key features include specific oxide compositions, low surface roughness, and a low dielectric dissipation factor.

How can the glass substrate benefit high-frequency devices?

The glass substrate can improve the performance, signal transmission efficiency, and reliability of high-frequency devices.


Original Abstract Submitted

A glass substrate for a high-frequency device, which contains, in terms of mole percent on the basis of oxides: 40 to 75% of SiO; 0 to 15% of AlO; 13 to 23% of BO; 2.5 to 11% of MgO; and 0 to 13% of CaO, and having a total content of alkali metal oxides in the range of 0.001-5%, where at least one main surface of the glass substrate has a surface roughness of 1.5 nm or less in terms of arithmetic average roughness Ra, and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.