18590436. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
Contents
- 1 RESIST COMPOSITION AND PATTERN FORMING PROCESS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 RESIST COMPOSITION AND PATTERN FORMING PROCESS - A simplified explanation of the abstract
- 1.4 Potential Applications
- 1.5 Problems Solved
- 1.6 Benefits
- 1.7 Commercial Applications
- 1.8 Prior Art
- 1.9 Frequently Updated Research
- 1.10 Questions about Resist Composition
- 1.11 Original Abstract Submitted
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Organization Name
Inventor(s)
Jun Hatakeyama of Joetsu-shi (JP)
RESIST COMPOSITION AND PATTERN FORMING PROCESS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18590436 titled 'RESIST COMPOSITION AND PATTERN FORMING PROCESS
The present invention is about a resist composition and a pattern forming process that includes a quencher capable of improving the Line Width Roughness (LWR) of line patterns or the Dimensional Uniformity (CDU) of hole patterns, as well as enhancing sensitivity. The resist composition contains a quencher with a sulfonium salt of a benzoic acid substituted with a C-Chydrocarbyloxy group having a trifluoromethyl group.
- The invention involves a quencher that improves the LWR of line patterns and the CDU of hole patterns.
- The resist composition includes a sulfonium salt of a benzoic acid with a specific substitution.
- The quencher enhances sensitivity in the pattern forming process.
- The technology aims to achieve better precision and uniformity in pattern formation.
- The innovation can potentially lead to higher quality and more reliable semiconductor devices.
Potential Applications
The technology can be applied in the semiconductor industry for the fabrication of advanced integrated circuits and microelectronics.
Problems Solved
The technology addresses issues related to line width roughness, dimensional uniformity, and sensitivity in pattern formation processes.
Benefits
- Improved precision and uniformity in pattern formation.
- Enhanced sensitivity for better control over the manufacturing process.
- Potential for higher quality and reliability in semiconductor devices.
Commercial Applications
Title: Advanced Resist Composition for Semiconductor Manufacturing The technology can be commercially utilized by semiconductor manufacturers to enhance the quality and performance of their products, leading to more efficient and reliable electronic devices.
Prior Art
Readers can explore prior research on resist compositions, quenchers, and pattern forming processes in the semiconductor industry to understand the evolution of this technology.
Frequently Updated Research
Researchers are continuously exploring new materials and techniques to further improve the precision and efficiency of resist compositions in semiconductor manufacturing.
Questions about Resist Composition
What are the key components of a resist composition?
A resist composition typically consists of a polymer, a photoactive compound, a solvent, and additives to enhance specific properties.
How does the quencher in the resist composition affect pattern formation?
The quencher plays a crucial role in improving the uniformity and sensitivity of patterns by controlling the reaction kinetics during exposure and development processes.
Original Abstract Submitted
The present invention relates to a resist composition and a pattern forming process. The quencher is capable of improving the LWR of line patterns or the dimensional uniformity (CDU) of hole patterns and enhancing sensitivity. The resist composition comprises a quencher containing a sulfonium salt of a benzoic acid which is substituted with a C-Chydrocarbyloxy group having a trifluoromethyl group.
