18679941. SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE, AND GAS CONCENTRATION MEASURING DEVICE simplified abstract (Asahi Kasei Microdevices Corporation)
Contents
SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE, AND GAS CONCENTRATION MEASURING DEVICE
Organization Name
Asahi Kasei Microdevices Corporation
Inventor(s)
SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE, AND GAS CONCENTRATION MEASURING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18679941 titled 'SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE, AND GAS CONCENTRATION MEASURING DEVICE
Simplified Explanation: The patent application describes a semiconductor wafer with reduced warpage to achieve a smaller size than conventional techniques. It includes a wafer substrate with a semiconductor stacked portion capable of emitting or receiving infrared light, and an optical filter on the opposite surface.
- The semiconductor wafer has reduced warpage to achieve a smaller size.
- It includes a wafer substrate with a semiconductor stacked portion for emitting or receiving infrared light.
- An optical filter is present on the opposite surface of the wafer substrate.
- The thickness of the wafer substrate and the optical filter must meet a specific relation to reduce warpage effectively.
Potential Applications: 1. Semiconductor manufacturing 2. Gas concentration measuring devices 3. Infrared technology applications
Problems Solved: 1. Reducing warpage in semiconductor wafers 2. Achieving smaller sizes than conventional techniques 3. Enhancing the performance of gas concentration measuring devices
Benefits: 1. Improved accuracy in gas concentration measurements 2. Enhanced efficiency in semiconductor manufacturing 3. Compact size for space-constrained applications
Commercial Applications: Optical sensors for gas detection in industrial settings
Questions about Semiconductor Wafer Technology: 1. How does reducing warpage in semiconductor wafers impact their performance? 2. What are the key advantages of using optical filters in semiconductor devices?
Frequently Updated Research: Ongoing studies on optimizing the thickness of optical filters for improved performance in gas concentration measuring devices.
Original Abstract Submitted
Provided are a semiconductor wafer, a semiconductor device, and a gas concentration measuring device having a size reduced by reducing warpage to be even smaller than the sizes that can be achieved by conventional techniques. The semiconductor wafer includes: a wafer substrate, a semiconductor stacked portion formed on a first surface of the wafer substrate, the semiconductor stacked portion being capable of emitting or receiving infrared light of 2 μm to 10 μm; and an optical filter formed on a second surface of the wafer substrate that is opposite to the first surface of the wafer substrate. The thickness T[μm] of the wafer substrate and the thickness T[μm] of the optical filter satisfy the relation of T≤0.000053×T.
