18608057. FILM FORMING APPARATUS simplified abstract (Tokyo Electron Limited)

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FILM FORMING APPARATUS

Organization Name

Tokyo Electron Limited

Inventor(s)

Tatsuya Yamaguchi of Nirasaki City (JP)

Syuji Nozawa of Nirasaki City (JP)

FILM FORMING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18608057 titled 'FILM FORMING APPARATUS

The film forming apparatus described in the patent application includes two vaporizers, pipes, and a chamber for vapor deposition polymerization.

  • The first vaporizer vaporizes a monomer containing isocyanate, while the second vaporizer vaporizes a monomer that reacts with the first monomer to form a polymer.
  • The first vaporizer heats the monomer to a temperature of 120 degrees C or less, with a pressure inside the vaporizer equal to or higher than the pressure in the chamber.
  • The differential pressure between the vaporizer and the chamber is 1 Torr or less, ensuring efficient polymer film formation on the substrate.

Potential Applications: - This technology can be used in the production of thin polymer films for various industries such as electronics, optics, and coatings. - It can also be applied in the development of advanced materials with specific properties and functionalities.

Problems Solved: - The apparatus addresses the need for a precise and controlled method of forming polymer films through vapor deposition polymerization. - It solves the challenge of achieving uniform and high-quality polymer coatings on substrates.

Benefits: - Improved efficiency and accuracy in the formation of polymer films. - Enhanced control over the properties and thickness of the polymer coatings. - Cost-effective and scalable production of thin films with tailored characteristics.

Commercial Applications: - The technology can be utilized in the manufacturing of electronic devices, optical components, protective coatings, and biomedical materials. - It offers opportunities for innovation in the development of advanced materials for various industrial applications.

Questions about the Film Forming Apparatus: 1. How does the differential pressure between the vaporizer and the chamber impact the polymer film formation process? 2. What are the specific advantages of using vapor deposition polymerization for creating thin polymer films?


Original Abstract Submitted

A film forming apparatus includes: a first vaporizer configured to vaporize a first monomer containing isocyanate; a second vaporizer configured to vaporize a second monomer that reacts with the first monomer to form a polymer; a first pipe connected to the first vaporizer; a second pipe connected to the second vaporizer; and a chamber having an internal space for accommodating a substrate, connected to the first pipe and the second pipe, and configured to form a polymer film on the substrate by vapor deposition polymerization using the first monomer and the second monomer. The first vaporizer heats the first monomer to a temperature of 120 degrees C. or less. A pressure inside the first vaporizer is equal to or higher than a pressure in the chamber. A differential pressure between the pressure inside the first vaporizer and the pressure in the chamber is 1 Torr or less.