18584218. PROCESS CHAMBER CLEAN simplified abstract (Applied Materials, Inc.)
Contents
PROCESS CHAMBER CLEAN
Organization Name
Inventor(s)
Wolfgang R. Aderhold of Cupertino CA (US)
Karthik Raman Sharma of Fremont CA (US)
PROCESS CHAMBER CLEAN - A simplified explanation of the abstract
This abstract first appeared for US patent application 18584218 titled 'PROCESS CHAMBER CLEAN
The patent application describes a method of cleaning a process chamber by supplying plasma from a remote plasma source to the interior volume of a rapid thermal processing chamber while heating the chamber with lamps.
- Plasma is supplied from a remote source to clean the process chamber.
- The rapid thermal processing chamber contains lamps that heat the interior volume.
- The plasma and heat work together to effectively clean the chamber.
- This method ensures thorough cleaning of the process chamber.
- The combination of plasma and heat optimizes the cleaning process.
Potential Applications: - Semiconductor manufacturing - Solar cell production - Thin film deposition processes
Problems Solved: - Ensures thorough cleaning of process chambers - Improves overall efficiency of cleaning processes
Benefits: - Enhanced cleaning performance - Increased productivity in manufacturing processes - Extended equipment lifespan
Commercial Applications: Title: "Advanced Cleaning Method for Process Chambers" This technology can be utilized in various industries such as semiconductor manufacturing, solar cell production, and thin film deposition processes. It offers improved cleaning performance, increased productivity, and extended equipment lifespan, making it a valuable asset for companies looking to optimize their manufacturing processes.
Questions about the technology: 1. How does the method of supplying plasma from a remote source improve the cleaning process compared to traditional methods? - The method of supplying plasma from a remote source allows for more effective and efficient cleaning of the process chamber compared to traditional methods. The plasma can reach areas that may be difficult to access with other cleaning techniques, ensuring a thorough cleaning process.
2. What are the key advantages of using lamps to heat the interior volume of the rapid thermal processing chamber during the cleaning process? - Using lamps to heat the interior volume of the rapid thermal processing chamber provides consistent and controlled heating, which is essential for optimizing the cleaning process. This method ensures that the chamber reaches the necessary temperature for effective cleaning, leading to improved overall efficiency.
Original Abstract Submitted
A method of cleaning a process chamber is provided including supplying a plasma from a remote plasma source to an interior volume of a rapid thermal processing chamber during a first time period, the rapid thermal processing chamber including a plurality of lamps configured to heat an interior volume of the rapid thermal processing chamber; and providing heat from the plurality of lamps to heat the interior volume of the rapid thermal processing chamber during the first time period when the plasma from the remote plasma source is provided to the interior volume of the rapid thermal processing chamber.
