18537644. IMAGE SENSOR AND MANUFACTURING METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
IMAGE SENSOR AND MANUFACTURING METHOD THEREOF
Organization Name
Inventor(s)
Joonhyuk Hwang of Suwon-si (KR)
IMAGE SENSOR AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract
This abstract first appeared for US patent application 18537644 titled 'IMAGE SENSOR AND MANUFACTURING METHOD THEREOF
The patent application describes an image sensor with a light-blocking film that effectively blocks light in a specific region.
- The structure includes a first substrate with transistors on one surface and a light-receiving surface on the other.
- The first substrate has a pixel array region and a light-blocking region.
- An anti-reflection structure is present on the light-receiving surface in both regions.
- A light-blocking structure, made of stacked films, is on the anti-reflection structure in the light-blocking region.
Potential Applications: - This technology can be used in digital cameras, smartphones, and other devices with image sensors. - It can improve image quality by reducing unwanted light interference.
Problems Solved: - Prevents light leakage in specific regions of the image sensor. - Enhances the overall performance and accuracy of the image sensor.
Benefits: - Improved image quality and sharpness. - Enhanced sensitivity to light. - Reduction of noise and interference in captured images.
Commercial Applications: - This technology can be applied in the consumer electronics industry for the development of high-quality cameras and imaging devices.
Questions about the technology: 1. How does the light-blocking film improve the performance of the image sensor? 2. What are the specific advantages of using stacked films in the light-blocking structure?
Frequently Updated Research: - Stay updated on advancements in image sensor technology, particularly in the field of light-blocking films and anti-reflection structures.
Original Abstract Submitted
An image sensor having a structure in which a light-blocking film having an excellent light-blocking effect is provided in a light-blocking region includes a first substrate including a first surface and a second surface, the first surface including a plurality of transistors, and the second surface being opposite to the first surface and configured to receive light, the first substrate comprising a pixel array region and a light-blocking region, an anti-reflection structure on the second surface of the first substrate in the pixel array region and the light-blocking region, and a light-blocking structure on the anti-reflection structure in the light-blocking region, wherein the light-blocking structure comprises a plurality of film that are sequentially stacked, the plurality of film including at least a first conductive film, a first insulating film, and a second conductive film.