18731895. IMAGE SENSOR simplified abstract (Samsung Electronics Co., Ltd.)

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IMAGE SENSOR

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Kook-tae Kim of Hwaseong-si (KR)

Jin-gyun Kim of Hwaseong-si (KR)

Soo-jin Hong of Guri-si (KR)

IMAGE SENSOR - A simplified explanation of the abstract

This abstract first appeared for US patent application 18731895 titled 'IMAGE SENSOR

Simplified Explanation: The patent application describes an image sensor with a unique pixel isolation film that includes a buried conductive layer containing polysilicon with a fining element at a specific concentration, along with an insulating liner.

  • The image sensor has a semiconductor substrate with active pixels defined by the pixel isolation film.
  • The buried conductive layer in the pixel isolation film contains polysilicon with a fining element at a specific concentration.
  • An insulating liner separates the buried conductive layer from the semiconductor substrate.
  • The fining element in the buried conductive layer includes oxygen, carbon, or fluorine.

Key Features and Innovation:

  • Pixel isolation film with buried conductive layer and insulating liner.
  • Polysilicon with a fining element at a specific concentration.
  • Active pixels defined in the semiconductor substrate.
  • Fining element includes oxygen, carbon, or fluorine.

Potential Applications: The technology can be used in various imaging devices such as cameras, smartphones, and medical imaging equipment.

Problems Solved: The technology addresses the need for improved pixel isolation and conductivity in image sensors.

Benefits:

  • Enhanced image quality.
  • Improved pixel performance.
  • Increased sensor efficiency.

Commercial Applications: Potential commercial applications include digital cameras, surveillance systems, and medical imaging devices. The technology could also be used in scientific research equipment.

Questions about Image Sensor Technology: 1. How does the buried conductive layer improve pixel isolation in the image sensor? 2. What are the advantages of using polysilicon with a fining element in the pixel isolation film?

Frequently Updated Research: Researchers are continually exploring ways to enhance image sensor technology, including improving pixel isolation and conductivity for better overall performance.


Original Abstract Submitted

An image sensor including a semiconductor substrate having a first surface and a second surface; and a pixel isolation film extending from the first surface of the semiconductor substrate into the semiconductor substrate and defining active pixels in the semiconductor substrate, wherein the pixel isolation film includes a buried conductive layer including polysilicon containing a fining element at a first concentration; and an insulating liner between the buried conductive layer and the semiconductor substrate, and wherein the fining element includes oxygen, carbon, or fluorine.