18439492. SUBSTRATE SUPPORTER simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SUBSTRATE SUPPORTER
Organization Name
Inventor(s)
Jun Hyung Kim of Suwon-si (KR)
SUBSTRATE SUPPORTER - A simplified explanation of the abstract
This abstract first appeared for US patent application 18439492 titled 'SUBSTRATE SUPPORTER
The abstract of this patent application describes a substrate supporter for substrate processing apparatuses. The substrate supporter includes an upper surface for loading a substrate, a base, an outer dam along the base's edge, a contact band connected to the outer dam for substrate loading, and a first contact pattern adjacent to the contact band.
- The substrate supporter has an outer dam and contact band for secure substrate loading.
- A first contact pattern extends into the contact band, providing additional support.
- The first contact pattern has a larger area than where the contact band overlaps with the substrate.
- This design ensures stable substrate placement and processing.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Solar panel production
Problems Solved: - Ensures precise and stable substrate loading - Prevents substrate misalignment during processing
Benefits: - Improved processing accuracy - Enhanced production efficiency - Reduced substrate wastage
Commercial Applications: Title: Advanced Substrate Supporter for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to enhance production efficiency and accuracy.
Questions about Substrate Supporter Technology: 1. How does the first contact pattern improve substrate loading stability? The first contact pattern extends into the contact band, providing additional support for the substrate. 2. What are the potential applications of this substrate supporter technology? This technology can be applied in various industries such as semiconductor manufacturing, thin film deposition, and solar panel production.
Original Abstract Submitted
The present disclosure relates to substrate supporters and substrate processing apparatuses. An example substrate supporter includes an upper surface on which a substrate is loaded, a base, an outer dam extending along an edge of the base, a contact band connected with the outer dam, extending along the circumferential direction of the base, and onto which the substrate is loaded, and a first contact pattern disposed adjacent to the contact band and extending into an inside of the contact band, the first contact pattern extending along the circumferential direction of the base, where an area of the first contact pattern is larger than an area where the contact band overlaps with the substrate.
