Samsung display co., ltd. (20240321895). DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME simplified abstract
Contents
DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
Organization Name
Inventor(s)
Yeonhong Kim of Yongin-si (KR)
Junghoon Lee of Yongin-si (KR)
DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240321895 titled 'DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
The abstract describes a display device with multiple layers including oxide semiconductor layers and gate insulating layers of varying thicknesses.
- The display device consists of a substrate, first and second oxide semiconductor layers, and first and second gate insulating layers.
- The first oxide semiconductor layer contains a channel region between a source and drain region, as does the second oxide semiconductor layer.
- The difference in thickness between the first and second gate insulating layers is 500 Å or less.
Potential Applications: - This technology could be used in the manufacturing of high-resolution displays for electronic devices. - It may find applications in the development of advanced touchscreens and flexible displays.
Problems Solved: - The technology addresses the need for improved performance and efficiency in display devices. - It aims to enhance the overall quality and functionality of electronic screens.
Benefits: - Improved display resolution and clarity. - Enhanced durability and flexibility of display screens. - Increased efficiency and performance of electronic devices.
Commercial Applications: Title: Advanced Display Technology for Enhanced Visual Experience This technology could be utilized in the production of smartphones, tablets, laptops, and other electronic devices with display screens. It has the potential to revolutionize the visual experience for users and drive innovation in the electronics industry.
Questions about Display Device Technology: 1. How does the varying thickness of the gate insulating layers impact the performance of the display device?
- The difference in thickness helps control the flow of current in the semiconductor layers, leading to improved efficiency and performance.
2. What are the key advantages of using oxide semiconductor layers in display devices?
- Oxide semiconductor layers offer high electron mobility, low leakage current, and improved transparency, making them ideal for display applications.
Original Abstract Submitted
a display device includes a substrate, a first oxide semiconductor layer on the substrate, a first gate insulating layer on the substrate and covering an upper surface of the first oxide semiconductor layer, a second oxide semiconductor layer on the first gate insulating layer, and a second gate insulating layer covering an upper surface of the second oxide semiconductor layer. the first oxide semiconductor layer includes a channel region between a source region and a drain region the second oxide semiconductor layer includes a channel region between a source region and a drain region. a difference between a thickness of the first gate insulating layer and a thickness of the second gate insulating layer is 500 Å or less.
