Samsung display co., ltd. (20240316571). SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE USING THE SAME simplified abstract
Contents
SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE USING THE SAME
Organization Name
Inventor(s)
YOUNG-HUN Park of Yongin-si (KR)
CHANGWOOK Seo of Yongin-si (KR)
SEUNG GEUN Yun of Yongin-si (KR)
SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240316571 titled 'SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE USING THE SAME
The abstract describes a substrate treating apparatus with a chamber cavity, a movable substrate carrier, and a filter with a rotatable magnet filter.
- Simplified Explanation:
- The apparatus treats substrates in a chamber with a movable carrier and a filter with a rotatable magnet.
- Key Features and Innovation:
- Chamber cavity for substrate treatment. - Movable substrate carrier for easy handling. - Filter with a rotatable magnet for efficient filtration.
- Potential Applications:
- Semiconductor manufacturing. - Thin film deposition processes. - Solar panel production.
- Problems Solved:
- Ensures proper treatment of substrates. - Improves filtration efficiency. - Enhances overall process reliability.
- Benefits:
- Increased productivity. - Improved quality of treated substrates. - Reduced maintenance requirements.
- Commercial Applications:
- "Substrate Treating Apparatus for Semiconductor Manufacturing and Thin Film Deposition Processes"
- Questions about Substrate Treating Apparatus:
1. How does the rotatable magnet filter improve filtration efficiency? - The rotatable magnet filter allows for better separation of particles, enhancing filtration performance.
2. What are the potential cost savings associated with using this substrate treating apparatus? - The improved efficiency and reliability of the apparatus can lead to reduced maintenance costs and increased productivity over time.
Original Abstract Submitted
a substrate treating apparatus includes a chamber defining a chamber cavity, a substrate carrier movable in a first direction inside of the chamber cavity, and a filter disposed inside the chamber cavity, defining an opening through which the substrate carrier passes, and including a magnet filter disposed in the opening and being rotatable.
