Samsung electronics co., ltd. (20240321580). PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract

PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Dong Jin Park of Suwon-si (KR)

Sung-Yong Moon of Suwon-si (KR)

Jun Young Jang of Suwon-si (KR)

PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240321580 titled 'PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME

The abstract of a patent application describes a method for manufacturing a photomask, involving defining a main region and a dummy region based on layout data, and forming a dummy pattern to fill the dummy region.

• Key Features and Innovation:

   - The method involves creating a dummy pattern in the empty space outside the main region of the photomask.
   - The dummy pattern is formed by placing pattern blocks in the dummy region to create sub-regions.
   - The first pattern blocks have a larger area than the second pattern blocks, creating a layered structure in the dummy region.

• Potential Applications:

   - This method can be used in the semiconductor industry for producing photomasks used in the fabrication of integrated circuits.
   - It can improve the efficiency and accuracy of photomask manufacturing processes.

• Problems Solved:

   - This method helps optimize the use of space on the photomask, ensuring that the dummy region is filled effectively.
   - It allows for better organization and layout of patterns on the photomask.

• Benefits:

   - Enhanced precision and consistency in photomask manufacturing.
   - Reduction of material waste and production costs.
   - Improved quality of final products in the semiconductor industry.

• Commercial Applications:

   - This technology can be applied in semiconductor manufacturing companies for producing photomasks used in the production of microchips.
   - It can also be utilized by photomask manufacturers to enhance their production processes and offer more efficient services to their clients.

• Questions about Photomask Manufacturing:

   - How does the method of creating a dummy pattern improve the efficiency of photomask manufacturing?
   - What are the potential cost-saving benefits of using this manufacturing method in the semiconductor industry?

• Frequently Updated Research:

   - Stay updated on advancements in photomask manufacturing technology to ensure the most efficient and effective production processes are being utilized.

Original Abstract Submitted

a photomask manufacturing method includes defining a main region and a dummy region based on a layout data, wherein the main region corresponds to an outer boundary surrounding functional patterns defined by the layout data and the dummy region corresponds to an empty space outside the main region, and forming a dummy pattern to fill the dummy region. the forming of the dummy pattern includes placing at least one first pattern block in the dummy region to form a first sub-region, each of the at least one first pattern block having a first area, and placing, after completing the placing of the at least one first pattern block in the dummy region, at least one second pattern block in the dummy region except the first sub-region to form a second sub-region, each of the at least one second pattern block having a second area smaller than the first area.