Samsung electronics co., ltd. (20240319595). PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND simplified abstract

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PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND

Organization Name

samsung electronics co., ltd.

Inventor(s)

Hoyoon Park of Suwon-si (KR)

Haengdeog Koh of Suwon-si (KR)

Yoonhyun Kwak of Suwon-si (KR)

Minsang Kim of Suwon-si (KR)

Beomseok Kim of Suwon-si (KR)

Hana Kim of Suwon-si (KR)

Hyeran Kim of Suwon-si (KR)

Chanjae Ahn of Suwon-si (KR)

Kyuhyun Im of Suwon-si (KR)

Sungwon Choi of Suwon-si (KR)

PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240319595 titled 'PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND

Simplified Explanation: The patent application describes a photoreactive polymer compound and a photoresist composition containing the compound for forming patterns.

Key Features and Innovation:

  • Photoreactive polymer compound with a first repeating unit represented by formula 1.
  • Photoresist composition for creating patterns using the compound.
  • Method of forming patterns with the photoresist composition.

Potential Applications: The technology can be used in semiconductor manufacturing, microelectronics, and nanotechnology for creating intricate patterns.

Problems Solved: The technology enables precise and efficient patterning processes in various industries.

Benefits:

  • Enhanced precision in pattern formation.
  • Improved efficiency in manufacturing processes.
  • Versatile applications in different industries.

Commercial Applications: The technology can be utilized in the production of electronic devices, sensors, and other high-tech products, potentially impacting the semiconductor market.

Questions about Photoreactive Polymer Compound: 1. How does the photoreactive polymer compound improve pattern formation processes? 2. What are the key advantages of using the photoresist composition in manufacturing applications?

Frequently Updated Research: Stay updated on advancements in photolithography techniques and materials for pattern formation in various industries.


Original Abstract Submitted

provided are a photoreactive polymer compound including a first repeating unit represented by formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:

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