Samsung electronics co., ltd. (20240319594). RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Chanjae Ahn of Suwon-si (KR)

Cheol Kang of Suwon-si (KR)

Minsang Kim of Suwon-si (KR)

Beomseok Kim of Suwon-si (KR)

Changki Kim of Suwon-si (KR)

Hana Kim of Suwon-si (KR)

Hyeran Kim of Suwon-si (KR)

Changheon Lee of Suwon-si (KR)

Sungwon Choi of Suwon-si (KR)

Hyunseok Choi of Hwaseong-si (KR)

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240319594 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

The resist composition described in the abstract of the patent application includes a polymer with a specific repeating unit, a photoacid generator, and an organic solvent.

• The resist composition contains a polymer with a first repeating unit, a photoacid generator, and an organic solvent.
• The pattern forming method utilizes the resist composition to create patterns on a substrate.
• The resist composition is designed to be sensitive to light, allowing for precise pattern formation.
• The use of a specific polymer with a defined repeating unit enhances the performance of the resist composition.
• The inclusion of a photoacid generator ensures the resist composition reacts effectively to light exposure.

Potential Applications: - Semiconductor manufacturing - Photolithography processes - Microelectronics industry

Problems Solved: - Improving pattern formation accuracy - Enhancing resist sensitivity to light exposure

Benefits: - Increased precision in pattern formation - Improved efficiency in semiconductor manufacturing processes

Commercial Applications: "Advanced Resist Composition for Semiconductor Manufacturing: Enhancing Precision and Efficiency"

Questions about the technology: 1. How does the specific polymer composition impact the performance of the resist? 2. What are the potential challenges in scaling up the use of this resist composition in industrial applications?

Frequently Updated Research: Ongoing research focuses on optimizing the resist composition for even greater precision and efficiency in semiconductor manufacturing processes.

Original Abstract Submitted

provided are a resist composition and a pattern forming method using the same. the resist composition includes a polymer including a first repeating unit repeating unit formula 1, a photoacid generator, and an organic solvent.