Samsung electronics co., ltd. (20240319592). RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Changheon Lee of Suwon-si (KR)

Haengdeog Koh of Suwon-si (KR)

Yoonhyun Kwak of Suwon-si (KR)

Mijeong Kim of Suwon-si (KR)

Sunyoung Lee of Suwon-si (KR)

Kyuhyun Im of Suwon-si (KR)

Jinwon Jeon of Suwon-si (KR)

Jungha Chae of Suwon-si (KR)

Sunghyun Han of Suwon-si (KR)

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240319592 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

The abstract of the patent application describes a resist composition and a method of forming a pattern using the same, with the resist composition containing an organometallic compound and a polymer.

• The resist composition includes an organometallic compound represented by formula 1 and a polymer with a repeating unit represented by formula 2.
• The method involves using this resist composition to form patterns, likely for semiconductor manufacturing or other high-tech industries.
• The combination of the organometallic compound and polymer allows for precise patterning and high resolution in the final product.
• This innovation could lead to advancements in nanotechnology, electronics, and other fields requiring intricate patterning processes.
• The resist composition may have improved sensitivity, resolution, and etch resistance compared to existing materials.

Potential Applications: - Semiconductor manufacturing - Nanotechnology research - Electronics industry

Problems Solved: - Achieving high-resolution patterns - Enhancing sensitivity and etch resistance in patterning processes

Benefits: - Improved precision in pattern formation - Enhanced resolution in final products - Potential for increased efficiency in manufacturing processes

Commercial Applications: Title: Advanced Resist Composition for High-Resolution Patterning in Semiconductor Manufacturing This technology could be used in the production of microchips, sensors, and other electronic components where precise patterning is crucial for performance.

Questions about the technology: 1. How does the resist composition improve sensitivity in pattern formation? - The resist composition likely enhances sensitivity through the unique properties of the organometallic compound and polymer, allowing for more precise patterning. 2. What potential challenges could arise when implementing this resist composition in industrial manufacturing processes? - Challenges may include scalability, compatibility with existing equipment, and cost-effectiveness.

Original Abstract Submitted

provided are a resist composition and a method of forming a pattern using the same, wherein the resist composition may include an organometallic compound represented by formula 1 below, and a polymer including a repeating unit represented by formula 2 below.