Samsung electronics co., ltd. (20240318307). SUBSTRATE PROCESSING DEVICE simplified abstract
Contents
SUBSTRATE PROCESSING DEVICE
Organization Name
Inventor(s)
Byunghwan Kong of Suwon-si (KR)
SUBSTRATE PROCESSING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240318307 titled 'SUBSTRATE PROCESSING DEVICE
The patent application describes a substrate processing device with a first tube for loading substrates, a second tube enclosing the first tube, and a process gas supply line for injecting gas into the first tube.
- The first tube has exhaust holes in the sidewall, including a main exhaust hole and a multi-exhaust hole region with smaller auxiliary exhaust holes.
- The height of the auxiliary exhaust holes is less than the main exhaust hole, creating a specific exhaust pattern for efficient processing.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Solar cell production
Problems Solved: - Improved gas distribution and exhaust efficiency - Enhanced substrate processing uniformity
Benefits: - Higher quality and consistency in substrate processing - Increased productivity and yield in manufacturing processes
Commercial Applications: - Equipment manufacturers for semiconductor industry - Research institutions for thin film deposition studies
Questions about the technology: 1. How does the exhaust hole design impact substrate processing efficiency? 2. What are the specific benefits of the multi-exhaust hole region in the first tube design?
Frequently Updated Research: - Ongoing studies on optimizing exhaust patterns for various substrate materials and sizes.
Original Abstract Submitted
provided is a substrate processing device including a first tube configured to load a substrate in an interior space thereof, a second tube configured to include the first tube therein, and a process gas supply line configured to inject process gas to the interior space of the first tube, wherein the first tube has a plurality of exhaust holes penetrating a sidewall of the first tube, the plurality of exhaust holes include a main exhaust hole and a multi-exhaust hole region disposed in a line in the vertical direction, the multi-exhaust hole region includes a plurality of auxiliary exhaust holes, and the height of each of the plurality of auxiliary exhaust holes is less than the height of the main exhaust hole.
