Samsung electronics co., ltd. (20240317672). POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME
Organization Name
Inventor(s)
Dmitry Androsov of Suwon-si (KR)
Haengdeog Koh of Suwon-si (KR)
Yoonhyun Kwak of Suwon-si (KR)
POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240317672 titled 'POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME
The abstract of the patent application describes a polycarboxylate compound, a resist composition containing the compound, and a method for forming a pattern using the compound.
- Simplified Explanation:
- The patent application discusses a specific chemical compound, its use in a resist composition, and a method for creating patterns.
- Key Features and Innovation:
- Novel polycarboxylate compound represented by formula 1. - Resist composition incorporating the compound. - Method for forming patterns using the compound.
- Potential Applications:
- Semiconductor manufacturing. - Photolithography processes. - Microelectronics industry.
- Problems Solved:
- Improving pattern formation accuracy. - Enhancing resist performance. - Increasing efficiency in semiconductor production.
- Benefits:
- Higher quality patterns. - Improved process control. - Cost-effective manufacturing.
- Commercial Applications:
- Potential for use in semiconductor fabrication. - Market implications in microelectronics industry.
- Questions about Polycarboxylate Compound:
1. How does the compound improve resist performance? - The compound enhances resist sensitivity and resolution, leading to better pattern formation.
2. What sets this compound apart from existing alternatives? - The unique structure and properties of the compound make it a valuable addition to resist compositions for pattern formation.
Original Abstract Submitted
disclosed are a polycarboxylate compound represented by formula 1 below, a resist composition including the same, and a method of forming a pattern using the same.
