Tokyo electron limited (20240295023). SUBSTRATE PROCESSING APPARATUS simplified abstract
Contents
SUBSTRATE PROCESSING APPARATUS
Organization Name
Inventor(s)
Makoto Takahashi of Iwate (JP)
SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240295023 titled 'SUBSTRATE PROCESSING APPARATUS
Simplified Explanation: The patent application describes a substrate processing apparatus with a gas exhaust system.
- Processing container for holding substrate holder
- Gas exhaust chamber in side wall of container
- Exhaust-side pipe extending horizontally from gas exhaust chamber
- Ejector detachably disposed spanning gas exhaust chamber and exhaust-side pipe
Key Features and Innovation:
- Gas exhaust system integrated into processing container
- Ejector for efficient gas exhaust
- Detachable design for easy maintenance
Potential Applications:
- Semiconductor manufacturing
- Thin film deposition processes
- Solar panel production
Problems Solved:
- Efficient gas exhaust in substrate processing
- Maintenance and cleaning of gas exhaust system
Benefits:
- Improved processing efficiency
- Reduced downtime for maintenance
- Enhanced substrate quality
Commercial Applications: Gas exhaust systems like this could be used in semiconductor fabrication facilities, thin film coating plants, and solar panel manufacturing companies to improve production processes and product quality.
Prior Art: Readers interested in prior art related to gas exhaust systems in substrate processing apparatus may explore patents in the field of semiconductor manufacturing equipment and vacuum deposition systems.
Frequently Updated Research: Stay informed about the latest developments in gas exhaust technology for substrate processing by following research publications in materials science and semiconductor manufacturing journals.
Questions about Gas Exhaust Systems in Substrate Processing: 1. What are the key advantages of integrating a gas exhaust system into a substrate processing apparatus? 2. How does the detachable design of the ejector contribute to the efficiency of gas exhaust in the processing container?
Original Abstract Submitted
a substrate processing apparatus includes: a processing container capable of accommodating a substrate holder that holds substrates; a gas exhaust chamber provided in a side wall of the processing container, an exhaust-side pipe extending horizontally from the gas exhaust chamber, and an ejector detachably disposed spanning through the gas exhaust chamber and the exhaust-side pipe.
