PROCESSING METHOD AND PROCESSING APPARATUS

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PROCESSING METHOD AND PROCESSING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240295022 titled 'PROCESSING METHOD AND PROCESSING APPARATUS

The abstract of the patent application describes a processing method that involves introducing a halogen-containing gas into a process chamber to eliminate a metal oxide film present in the chamber.

Halogen-containing gas is supplied into the process chamber.
Metal oxide film is removed from the process chamber.
The method aims to improve the efficiency and effectiveness of the processing operation.
This innovation can be applied in various industries such as semiconductor manufacturing, electronics, and materials science.
The technology addresses the challenge of metal oxide film buildup in process chambers, which can negatively impact the quality of the final product.
By removing the metal oxide film, the method ensures better performance and reliability of the processing equipment.

Potential Applications: - Semiconductor manufacturing - Electronics industry - Materials science research

Problems Solved: - Buildup of metal oxide film in process chambers - Degradation of processing equipment performance - Quality issues in final products

Benefits: - Improved processing efficiency - Enhanced product quality - Extended equipment lifespan

Commercial Applications: - Semiconductor fabrication facilities - Electronics manufacturing plants - Research laboratories in materials science

Questions about the technology: 1. How does the presence of metal oxide film affect the processing operation? 2. What are the specific advantages of using a halogen-containing gas in this method?

Original Abstract Submitted

a processing method includes supplying a halogen-containing gas into a process chamber and removing a metal oxide film in the process chamber.