18595913. METHODS FOR COATING A SUBSTRATE WITH MAGNESIUM FLUORIDE VIA ATOMIC LAYER DEPOSITION simplified abstract (CORNING INCORPORATED)
Contents
METHODS FOR COATING A SUBSTRATE WITH MAGNESIUM FLUORIDE VIA ATOMIC LAYER DEPOSITION
Organization Name
Inventor(s)
Ming-Huang Huang of Ithaca NY (US)
Hoon Kim of Horseheads NY (US)
METHODS FOR COATING A SUBSTRATE WITH MAGNESIUM FLUORIDE VIA ATOMIC LAYER DEPOSITION - A simplified explanation of the abstract
This abstract first appeared for US patent application 18595913 titled 'METHODS FOR COATING A SUBSTRATE WITH MAGNESIUM FLUORIDE VIA ATOMIC LAYER DEPOSITION
The patent application describes atomic layer deposition methods for coating an optical substrate with magnesium fluoride. The process involves forming a magnesium oxide layer on the substrate surface and converting it to a magnesium fluoride layer, which can be repeated to create multiple layers for an antireflective coating.
- Formation of magnesium oxide layer on the substrate surface
- Conversion of magnesium oxide layer to magnesium fluoride layer
- Repeatable process to create multiple magnesium fluoride layers
- Antireflective coating for optical substrates
- Potential applications in optical lenses and other optical devices
Potential Applications: - Optical lenses - Cameras - Microscopes - Telescopes
Problems Solved: - Reduce reflection on optical surfaces - Improve optical clarity - Enhance overall optical performance
Benefits: - Improved optical quality - Reduced glare and reflection - Enhanced durability of optical substrates
Commercial Applications: - Optical lens manufacturing industry - Camera and photography equipment industry - Microscope and telescope manufacturers
Questions about Atomic Layer Deposition Methods for Coating an Optical Substrate with Magnesium Fluoride: 1. How does the atomic layer deposition process improve the performance of optical substrates? 2. What are the key advantages of using magnesium fluoride as an antireflective coating on optical lenses?
Frequently Updated Research: - Ongoing research on enhancing the efficiency of atomic layer deposition processes for optical coatings.
Original Abstract Submitted
Atomic layer deposition methods for coating an optical substrate with magnesium fluoride. The methods include two primary processes. The first process includes the formation of a magnesium oxide layer over a surface of a substrate. The second process includes converting the magnesium oxide layer to a magnesium fluoride layer. These two primary processes may be repeated a plurality of times to create multiple magnesium fluoride layers that make up a magnesium fluoride film. The magnesium fluoride film may serve as an antireflective coating layer for an optical substrate, such as an optical lens.
