18420661. SPACERS FOR FILTRATION APPLICATIONS simplified abstract (ENTEGRIS, INC.)

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SPACERS FOR FILTRATION APPLICATIONS

Organization Name

ENTEGRIS, INC.

Inventor(s)

Zhifeng Li of Acton MA (US)

John P. Puglia of Townsend MA (US)

SPACERS FOR FILTRATION APPLICATIONS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18420661 titled 'SPACERS FOR FILTRATION APPLICATIONS

    • Simplified Explanation:**

The patent application describes spacers made of cyclic polyolefin for filtration devices with through-holes to filter particles larger than 50 μm.

    • Key Features and Innovation:**
  • Spacers made of cyclic polyolefin for filtration devices
  • Substrate with through-holes for filtering particles larger than 50 μm
    • Potential Applications:**
  • Water filtration systems
  • Air filtration systems
  • Industrial filtration processes
    • Problems Solved:**
  • Efficient filtration of particles larger than 50 μm
  • Improved durability and performance of filtration devices
    • Benefits:**
  • Enhanced filtration efficiency
  • Longer lifespan of filtration devices
  • Reduced maintenance costs
    • Commercial Applications:**
  • Water treatment plants
  • Pharmaceutical manufacturing
  • Food and beverage processing industries
    • Questions about Spacers for Filtration Applications:**

1. How do spacers made of cyclic polyolefin improve filtration efficiency? 2. What are the potential applications of these spacers in industrial settings?

    • Frequently Updated Research:**

Ongoing research on the development of advanced filtration materials for improved performance and durability in various industries.


Original Abstract Submitted

Spacers for filtration applications are provided. A spacer for a filtration device comprises a substrate comprising a cyclic polyolefin. The substrate comprises a plurality of through-holes for filtering particles having an average particle size of greater than 50 μm. Filtration assemblies, filtration devices, and related systems and methods are also provided.