18624147. SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract (NANYA TECHNOLOGY CORPORATION)
Contents
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
Organization Name
Inventor(s)
Jhen-Yu Tsai of New Taipei City (TW)
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract
This abstract first appeared for US patent application 18624147 titled 'SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
Simplified Explanation:
The semiconductor device described in the abstract consists of various structures such as a channel structure, a dielectric structure, a gate structure, a first conductive structure, and a second conductive structure.
- The device includes a channel structure that allows the flow of electrical current.
- A dielectric structure is present to insulate different components of the device.
- A gate structure controls the flow of current through the channel.
- The first conductive structure is responsible for carrying electrical signals.
- The second conductive structure also plays a role in the conduction of electricity.
Key Features and Innovation:
- Integration of a channel structure for current flow.
- Inclusion of a dielectric structure for insulation.
- Implementation of a gate structure for current control.
- Utilization of first and second conductive structures for signal transmission.
Potential Applications:
The semiconductor device can be used in various electronic applications such as integrated circuits, microprocessors, and memory devices.
Problems Solved:
This technology addresses the need for efficient current flow, proper insulation, and effective signal transmission in semiconductor devices.
Benefits:
The benefits of this technology include improved performance, enhanced reliability, and increased functionality of electronic devices.
Commercial Applications:
Potential commercial applications of this technology include the manufacturing of advanced electronic devices, leading to innovations in the electronics industry.
Questions about Semiconductor Devices:
1. How does the integration of a channel structure impact the performance of semiconductor devices? 2. What are the advantages of using a gate structure in controlling current flow in electronic devices?
Original Abstract Submitted
A semiconductor device includes a channel structure, a dielectric structure, a gate structure, a first conductive structure, and a second conductive structure.
