Category:Danying Wang

Danying Wang

Executive Summary

Danying Wang is an inventor who has filed 1 patents. Their primary areas of innovation include {Flash degasification (the other groups take precedence)} (1 patents), Degasification of liquids (1 patents), Degasification of liquids (1 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• B01D19/0036 ({Flash degasification (the other groups take precedence)}): 1 patents
• B01D19/00 (Degasification of liquids): 1 patents
• B01D19/0031 (Degasification of liquids): 1 patents
• B08B3/041 ({Cleaning travelling work}): 1 patents
• B08B3/08 (the liquid having chemical or dissolving effect (substances used, see the relevant classes)): 1 patents
• B08B3/10 (with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration): 1 patents
• B08B3/12 (by sonic or ultrasonic vibrations (washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves): 1 patents
• B08B7/04 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
• F04B15/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents
• F04B23/00 (Pumping installations or systems (pumps characterised by combination with, or adaptation to, specific driving engines or motors): 1 patents
• H01L21/02052 ({Wet cleaning only (): 1 patents
• H01L21/02057 ({Cleaning during device manufacture}): 1 patents
• H01L21/67017 ({Apparatus for fluid treatment (): 1 patents
• H01L21/67051 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• H01L21/67092 ({Apparatus for mechanical treatment (or grinding or cutting, see the relevant groups in subclasses): 1 patents
• H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• B08B2203/007 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
• F04B23/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents

Companies

List of Companies

• ACM RESEARCH (SHANGHAI), INC.: 1 patents

Collaborators

• Fuping Chen (1 collaborations)
• Hui Wang (1 collaborations)
• Xi Wang (1 collaborations)
• Shena Jia (1 collaborations)
• Chaowei Jiang (1 collaborations)
• Yingwei Dai (1 collaborations)
• Jian Wang (1 collaborations)