Deprecated: Use of MediaWiki\Output\OutputPage::setIndexPolicy with index after noindex was deprecated in MediaWiki 1.43. [Called from MediaWiki\Output\OutputPage::setRobotPolicy in /home/forge/wikipatents.org/includes/Output/OutputPage.php at line 1008] in /home/forge/wikipatents.org/includes/debug/MWDebug.php on line 385
Category:Yifei Yan - WikiPatents Jump to content

Category:Yifei Yan

From WikiPatents
Revision as of 13:16, 21 July 2024 by Unknown user (talk) (Updating Category:Yifei_Yan)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

Yifei Yan

Executive Summary

Yifei Yan is an inventor who has filed 5 patents. Their primary areas of innovation include ELECTRONIC MEMORY DEVICES (2 patents), ELECTRONIC MEMORY DEVICES (2 patents), {characterised by their behaviour during the process, e.g. soluble masks, redeposited masks} (2 patents), and they have worked with companies such as Fujian Jinhua Integrated Circuit Co., Ltd. (5 patents). Their most frequent collaborators include (3 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

  • H10B12/0335 (ELECTRONIC MEMORY DEVICES): 2 patents
  • H10B12/315 (ELECTRONIC MEMORY DEVICES): 2 patents
  • H01L21/0335 ({characterised by their behaviour during the process, e.g. soluble masks, redeposited masks}): 2 patents
  • H01L21/0337 ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 2 patents
  • H01L21/0338 ({Process specially adapted to improve the resolution of the mask}): 2 patents
  • H01L23/528 ({Geometry or} layout of the interconnection structure {(): 2 patents
  • H10B12/09 (ELECTRONIC MEMORY DEVICES): 1 patents
  • H10B12/34 (ELECTRONIC MEMORY DEVICES): 1 patents
  • H01L27/0207 ({Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique}): 1 patents
  • H01L21/76229 (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
  • H01L23/562 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H01L29/0649 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • H10B12/482 (ELECTRONIC MEMORY DEVICES): 1 patents
  • H10B12/00 (Dynamic random access memory [DRAM] devices): 1 patents
  • G06F30/392 (Floor-planning or layout, e.g. partitioning or placement): 1 patents
  • G03F1/36 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • G03F7/70441 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
  • H01L21/76892 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents

Companies

List of Companies

  • Fujian Jinhua Integrated Circuit Co., Ltd.: 5 patents

Collaborators

Subcategories

This category has the following 5 subcategories, out of 5 total.

A

F

G

Y

Cookies help us deliver our services. By using our services, you agree to our use of cookies.