Category:Arie Jeffrey DEN BOEF

Arie Jeffrey DEN BOEF

Executive Summary

Arie Jeffrey DEN BOEF is an inventor who has filed 6 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (4 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), and they have worked with companies such as ASML Netherlands B.V. (5 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 4 patents
• G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/7085 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/70683 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01N21/956 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
• G03F7/7015 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70641 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706849 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G02F1/353 ({Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams}): 1 patents
• G02F1/3505 (Non-linear optics): 1 patents
• G02F1/3507 (Non-linear optics): 1 patents
• H05G2/00 (Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma (X-ray lasers): 1 patents
• G03F7/706843 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F9/7046 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G03F9/7042 ({for microlithography (measuring printed patterns for monitoring overlay): 1 patents
• G01B11/24 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS): 1 patents
• G03F7/70191 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

List of Companies

• ASML Netherlands B.V.: 5 patents
• ASML NETHERLANDS B.V.: 1 patents

Collaborators

• Simon Gijsbert Josephus MATHIJSSEN (2 collaborations)
• Hans BUTLER (2 collaborations)
• Jeroen Arnoldus Leonardus Johannes RAAYMAKERS (2 collaborations)
• Nitesh PANDEY (1 collaborations)
• Duygu AKBULUT (1 collaborations)
• Marinus Johannes Maria VAN DAM (1 collaborations)
• Hugo Augustinus Joseph CRAMER (1 collaborations)
• Engelbertus Antonius Fransiscus VAN DER PASCH (1 collaborations)
• Ferry ZIJP (1 collaborations)
• Marinus Petrus REIJNDERS (1 collaborations)
• Peter Michael KRAUS (1 collaborations)
• Sylvianne Dorothea Christina ROSCAM ABBING (1 collaborations)
• Filippo CAMPI (1 collaborations)
• ZhuangYan ZHANG (1 collaborations)
• Petrus Wilhelmus SMORENBURG (1 collaborations)
• Nan LIN (1 collaborations)
• Stefan Michiel WITTE (1 collaborations)
• Bram Antonius Gerardus LOMANS (1 collaborations)
• Patricius Aloysius Jacobus TINNEMANS (1 collaborations)
• Kaustuve BHATTACHARYYA (1 collaborations)
• Samee Ur REHMAN of Milpitas CA (US) (1 collaborations)
• Henricus Petrus Maria PELLEMANS (1 collaborations)