Category:Marco Jan-Jaco WIELAND

Marco Jan-Jaco WIELAND

Executive Summary

Marco Jan-Jaco WIELAND is an inventor who has filed 6 patents. Their primary areas of innovation include ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps (4 patents), ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps (2 patents), with scanning beams {( (2 patents), and they have worked with companies such as ASML Netherlands B.V. (6 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

H01J37/244 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 4 patents
H01J37/12 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
H01J37/28 (with scanning beams {(): 2 patents
H01J2237/2817 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
G01N23/2251 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 2 patents
H01J37/153 (External mechanical adjustment of electron or ion optical components (): 1 patents
H01J2237/1534 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J37/265 (Electron or ion microscopes; Electron or ion diffraction tubes): 1 patents
H01J2237/1205 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J2237/1207 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
G03F7/70325 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70558 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/7065 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G03F7/70655 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
G01N2223/6116 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
G01N2223/646 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
H01J37/226 (Optical or photographic arrangements associated with the tube {(using a CRT for the display of the image in a scanning electron microscope): 1 patents
H01J37/20 (Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support {(introducing the objects): 1 patents
H01J2237/2482 (Optical means): 1 patents
H01J37/222 ({Image processing arrangements associated with the tube (image data processing or generation, in general): 1 patents
H01J2237/221 (Treatment of data (mixing signals): 1 patents
H01J2237/24592 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
G01N23/203 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
H01J37/10 (Lenses): 1 patents