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- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379454). Source/Drain Regions and Methods of Forming Same simplified abstract (hist) [3,686 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379452). Dielectric Fins With Different Dielectric Constants and Sizes in Different Regions of a Semiconductor Device simplified abstract (hist) [4,145 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379450). TRANSISTOR ISOLATION REGIONS simplified abstract (hist) [3,639 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379449). SEMICONDUCTOR STRUCTURE simplified abstract (hist) [3,838 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379448). IN-SITU FORMATION OF METAL GATE MODULATORS simplified abstract (hist) [3,318 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379446). Dual Dopant Source/Drain Regions and Methods of Forming Same simplified abstract (hist) [3,145 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379445). Methods for Fabricating FinFETs Having Different Fin Numbers and Corresponding FinFETs Thereof simplified abstract (hist) [4,003 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:55, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379444). GATE-ALL-AROUND SEMICONDUCTOR DEVICE AND METHOD simplified abstract (hist) [4,821 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379443). METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE simplified abstract (hist) [3,570 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379442). SEMICONDUCTOR DEVICE WITH S/D BOTTOM ISOLATION AND METHODS OF FORMING THE SAME simplified abstract (hist) [5,084 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379441). METHODS FOR IMPROVEMENT OF PHOTORESIST PATTERNING PROFILE simplified abstract (hist) [4,526 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379440). TRANSISTORS WITH CHANNELS FORMED OF LOW-DIMENSIONAL MATERIALS AND METHOD FORMING SAME simplified abstract (hist) [3,864 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379439). SEMICONDUCTOR DEVICE AND METHOD simplified abstract (hist) [3,796 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379436). SELF-ALIGNED INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME simplified abstract (hist) [4,843 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379435). SEMICONDUCTOR STRUCTURE HAVING SELF-ALIGNED CONDUCTIVE STRUCTURE AND METHOD FOR FORMING THE SEMICONDUCTOR STRUCTURE simplified abstract (hist) [4,770 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379434). Fully Self-Aligned Interconnect Structure simplified abstract (hist) [4,398 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379433). CONDUCTIVE FEATURE FORMATION AND STRUCTURE USING BOTTOM-UP FILLING DEPOSITION simplified abstract (hist) [4,037 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379432). CONTACT FORMATION METHOD AND RELATED STRUCTURE simplified abstract (hist) [4,598 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379430). INTERCONNECT STRUCTURE INCLUDING GRAPHITE AND METHOD FORMING SAME simplified abstract (hist) [3,644 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 06:54, 21 November 2024 Taiwan semiconductor manufacturing company, ltd. (20240379428). SEMICONDUCTOR STRUCTURE WITH PULL-IN PLANARIZATION LAYER AND METHOD FORMING THE SAME simplified abstract (hist) [4,478 bytes] Wikipatents (talk | contribs) (Creating a new page)
