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- 04:02, 19 September 2024 Beijing xiaomi mobile software co., ltd. (20240302889). TEXT INPUT METHOD AND APPARATUS, AND STORAGE MEDIUM simplified abstract (hist) [3,813 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied Materials, Inc. patent applications on September 12th, 2024 (hist) [26,448 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240306391). CONTACT CONSTRUCTION FOR SEMICONDUCTOR DEVICES WITH LOW-DIMENSIONAL MATERIALS simplified abstract (hist) [4,734 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240306262). Lamp Housing Braze Improvement for Semiconductor Rapid Thermal Processing (RTP) Chamber simplified abstract (hist) [4,389 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304671). Methods For Forming Gate Structures simplified abstract (hist) [4,012 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304495). HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES simplified abstract (hist) [4,046 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304492). BACK SIDE DESIGN FOR FLAT SILICON CARBIDE SUSCEPTOR simplified abstract (hist) [3,867 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304486). DIFFERENTIAL SUBSTRATE BACKSIDE COOLING simplified abstract (hist) [3,589 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304478). METHODS AND SYSTEMS FOR TEMPERATURE CONTROL FOR A SUBSTRATE simplified abstract (hist) [4,197 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304470). HEATER ASSEMBLY WITH PROCESS GAP CONTROL FOR BATCH PROCESSING CHAMBERS simplified abstract (hist) [3,223 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304437). PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT simplified abstract (hist) [4,525 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:01, 19 September 2024 Applied materials, inc. (20240304430). REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER MANUFACTURING simplified abstract (hist) [4,412 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240304429). Novel arc management algorithm of RF generator and match box for CCP plasma chambers simplified abstract (hist) [3,343 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240304423). SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract (hist) [4,032 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240304422). PLASMA PROCESSING WITH INDEPENDENT TEMPERATURE CONTROL simplified abstract (hist) [3,352 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240302812). FABRICATION TOOL CALIBRATION simplified abstract (hist) [3,642 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240301584). METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO EPITAXIAL GROWTH simplified abstract (hist) [3,872 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240301552). ULTRA HIGH-K HAFNIUM OXIDE AND HAFNIUM ZIRCONIUM OXIDE FILMS simplified abstract (hist) [3,539 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240301549). METAL ORGANONITRILE PRECURSORS FOR THIN FILM DEPOSITION simplified abstract (hist) [4,136 bytes] Wikipatents (talk | contribs) (Creating a new page)
- 04:00, 19 September 2024 Applied materials, inc. (20240301546). SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE simplified abstract (hist) [4,517 bytes] Wikipatents (talk | contribs) (Creating a new page)