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Bibliographic details for US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract

Citation styles for US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract

APA style

US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract. (2023, December 1). WikiPatents, . Retrieved 12:19, September 25, 2024 from http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079.

MLA style

"US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract." WikiPatents, . 1 Dec 2023, 10:25 UTC. 25 Sep 2024, 12:19 <http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079>.

MHRA style

WikiPatents contributors, 'US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract', WikiPatents, , 1 December 2023, 10:25 UTC, <http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079> [accessed 25 September 2024]

Chicago style

WikiPatents contributors, "US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079 (accessed September 25, 2024).

CBE/CSE style

WikiPatents contributors. US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract [Internet]. WikiPatents, ; 2023 Dec 1, 10:25 UTC [cited 2024 Sep 25]. Available from: http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079.

Bluebook style

US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract, http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079 (last visited September 25, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079",
   note = "[Online; accessed 25-September-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18324260. CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "\url{http://wikipatents.org/index.php?title=US_Patent_Application_18324260._CLEANING_COMPOSITION_FOR_REMOVING_RESIDUES_ON_SURFACE,_METHOD_OF_CLEANING_METAL-CONTAINING_FILM_BY_USING_THE_SAME,_AND_METHOD_OF_MANUFACTURING_SEMICONDUCTOR_DEVICE_BY_USING_THE_SAME_simplified_abstract&oldid=9079}",
   note = "[Online; accessed 25-September-2024]"
 }


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