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Bibliographic details for 18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC)

Citation styles for 18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC)

APA style

18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC). (2024, July 8). WikiPatents, . Retrieved 17:48, September 19, 2024 from http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142.

MLA style

"18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC)." WikiPatents, . 8 Jul 2024, 06:20 UTC. 19 Sep 2024, 17:48 <http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142>.

MHRA style

WikiPatents contributors, '18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC)', WikiPatents, , 8 July 2024, 06:20 UTC, <http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142> [accessed 19 September 2024]

Chicago style

WikiPatents contributors, "18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC)," WikiPatents, , http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142 (accessed September 19, 2024).

CBE/CSE style

WikiPatents contributors. 18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC) [Internet]. WikiPatents, ; 2024 Jul 8, 06:20 UTC [cited 2024 Sep 19]. Available from: http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142.

Bluebook style

18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC), http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142 (last visited September 19, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142",
   note = "[Online; accessed 19-September-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18608191._Pitch_Reduction_Technology_Using_Alternating_Spacer_Depositions_During_the_Formation_of_a_Semiconductor_Device_and_Systems_Including_Same_simplified_abstract_(Lodestar_Licensing_Group_LLC)&oldid=89142}",
   note = "[Online; accessed 19-September-2024]"
 }


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