Cite This Page
Bibliographic details for US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- Page name: US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 30 November 2023 15:10 UTC
- Date retrieved: 23 June 2024 01:48 UTC
- Permanent URL: http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884
- Page Version ID: 8884
Citation styles for US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
APA style
US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract. (2023, November 30). WikiPatents, . Retrieved 01:48, June 23, 2024 from http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884.
MLA style
"US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract." WikiPatents, . 30 Nov 2023, 15:10 UTC. 23 Jun 2024, 01:48 <http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884>.
MHRA style
WikiPatents contributors, 'US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract', WikiPatents, , 30 November 2023, 15:10 UTC, <http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884> [accessed 23 June 2024]
Chicago style
WikiPatents contributors, "US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884 (accessed June 23, 2024).
CBE/CSE style
WikiPatents contributors. US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract [Internet]. WikiPatents, ; 2023 Nov 30, 15:10 UTC [cited 2024 Jun 23]. Available from: http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884.
Bluebook style
US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract, http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884 (last visited June 23, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract --- WikiPatents{,} ",
year = "2023",
url = "http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884",
note = "[Online; accessed 23-June-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract --- WikiPatents{,} ",
year = "2023",
url = "\url{http://wikipatents.org/index.php?title=US_Patent_Application_18232717._PHOTORESIST_UNDER-LAYER_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract&oldid=8884}",
note = "[Online; accessed 23-June-2024]"
}
