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Citation styles for 18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

APA style

18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, July 6). WikiPatents, . Retrieved 12:57, September 15, 2024 from http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105.

MLA style

"18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 6 Jul 2024, 07:13 UTC. 15 Sep 2024, 12:57 <http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105>.

MHRA style

WikiPatents contributors, '18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 6 July 2024, 07:13 UTC, <http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105> [accessed 15 September 2024]

Chicago style

WikiPatents contributors, "18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105 (accessed September 15, 2024).

CBE/CSE style

WikiPatents contributors. 18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 Jul 6, 07:13 UTC [cited 2024 Sep 15]. Available from: http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105.

Bluebook style

18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105 (last visited September 15, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105",
   note = "[Online; accessed 15-September-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18604127._METHOD_AND_APPARATUS_FOR_COATING_PHOTO_RESIST_OVER_A_SUBSTRATE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=86105}",
   note = "[Online; accessed 15-September-2024]"
 }