Cite This Page

Jump to navigation Jump to search

Bibliographic details for 18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, June 21). WikiPatents, . Retrieved 17:32, June 30, 2024 from http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681.

MLA style

"18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 21 Jun 2024, 17:09 UTC. 30 Jun 2024, 17:32 <http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681>.

MHRA style

WikiPatents contributors, '18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 21 June 2024, 17:09 UTC, <http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681> [accessed 30 June 2024]

Chicago style

WikiPatents contributors, "18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681 (accessed June 30, 2024).

CBE/CSE style

WikiPatents contributors. 18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Jun 21, 17:09 UTC [cited 2024 Jun 30]. Available from: http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681.

Bluebook style

18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681 (last visited June 30, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681",
   note = "[Online; accessed 30-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18366322._APPARATUS_AND_METHOD_FOR_FABRICATING_SEMICONDUCTOR_DEVICE_BY_USING_FOCUSED_ION_BEAM_AND_SCANNING_ELECTRON_MICROSCOPE_SUPPORTED_BY_ELECTRON_DIFFRACTION_PATTERN_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=76681}",
   note = "[Online; accessed 30-June-2024]"
 }


Retrieved from "http://wikipatents.org/index.php?title=Special:CiteThisPage"