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Bibliographic details for Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract

Citation styles for Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract

APA style

Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract. (2024, June 21). WikiPatents, . Retrieved 09:49, July 1, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470.

MLA style

"Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract." WikiPatents, . 21 Jun 2024, 16:42 UTC. 1 Jul 2024, 09:49 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract', WikiPatents, , 21 June 2024, 16:42 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470> [accessed 1 July 2024]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470 (accessed July 1, 2024).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract [Internet]. WikiPatents, ; 2024 Jun 21, 16:42 UTC [cited 2024 Jul 1]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470.

Bluebook style

Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470 (last visited July 1, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470",
   note = "[Online; accessed 1-July-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing company, ltd. (20240203740). SELF-PROTECTIVE LAYER FORMED ON HIGH-K DIELECTRIC LAYER simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240203740)._SELF-PROTECTIVE_LAYER_FORMED_ON_HIGH-K_DIELECTRIC_LAYER_simplified_abstract&oldid=76470}",
   note = "[Online; accessed 1-July-2024]"
 }


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