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Bibliographic details for 18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)

Citation styles for 18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)

APA style

18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation). (2024, June 14). WikiPatents, . Retrieved 21:05, June 29, 2024 from http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606.

MLA style

"18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)." WikiPatents, . 14 Jun 2024, 08:50 UTC. 29 Jun 2024, 21:05 <http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606>.

MHRA style

WikiPatents contributors, '18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)', WikiPatents, , 14 June 2024, 08:50 UTC, <http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606> [accessed 29 June 2024]

Chicago style

WikiPatents contributors, "18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)," WikiPatents, , http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606 (accessed June 29, 2024).

CBE/CSE style

WikiPatents contributors. 18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation) [Internet]. WikiPatents, ; 2024 Jun 14, 08:50 UTC [cited 2024 Jun 29]. Available from: http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606.

Bluebook style

18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation), http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606 (last visited June 29, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606",
   note = "[Online; accessed 29-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18411380._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_PRODUCING_ELECTRONIC_DEVICE_simplified_abstract_(FUJIFILM_Corporation)&oldid=74606}",
   note = "[Online; accessed 29-June-2024]"
 }


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