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Bibliographic details for 18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

Citation styles for 18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

APA style

18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, June 14). WikiPatents, . Retrieved 15:19, June 30, 2024 from http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393.

MLA style

"18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 14 Jun 2024, 06:29 UTC. 30 Jun 2024, 15:19 <http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393>.

MHRA style

WikiPatents contributors, '18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 14 June 2024, 06:29 UTC, <http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393> [accessed 30 June 2024]

Chicago style

WikiPatents contributors, "18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393 (accessed June 30, 2024).

CBE/CSE style

WikiPatents contributors. 18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 Jun 14, 06:29 UTC [cited 2024 Jun 30]. Available from: http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393.

Bluebook style

18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393 (last visited June 30, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393",
   note = "[Online; accessed 30-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18586925. SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18586925._SURFACE_MODIFICATION_LAYER_FOR_CONDUCTIVE_FEATURE_FORMATION_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=73393}",
   note = "[Online; accessed 30-June-2024]"
 }


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