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Citation styles for Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract

APA style

Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract. (2024, June 14). WikiPatents, . Retrieved 02:51, June 28, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206.

MLA style

"Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract." WikiPatents, . 14 Jun 2024, 04:22 UTC. 28 Jun 2024, 02:51 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract', WikiPatents, , 14 June 2024, 04:22 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206> [accessed 28 June 2024]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206 (accessed June 28, 2024).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract [Internet]. WikiPatents, ; 2024 Jun 14, 04:22 UTC [cited 2024 Jun 28]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206.

Bluebook style

Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206 (last visited June 28, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206",
   note = "[Online; accessed 28-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240194480). Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240194480)._Methods_of_Reducing_Gate_Spacer_Loss_During_Semiconductor_Manufacturing_simplified_abstract&oldid=72206}",
   note = "[Online; accessed 28-June-2024]"
 }