Cite This Page

Jump to navigation Jump to search

Bibliographic details for 18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, June 6). WikiPatents, . Retrieved 12:17, June 30, 2024 from http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687.

MLA style

"18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 6 Jun 2024, 02:21 UTC. 30 Jun 2024, 12:17 <http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687>.

MHRA style

WikiPatents contributors, '18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 6 June 2024, 02:21 UTC, <http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687> [accessed 30 June 2024]

Chicago style

WikiPatents contributors, "18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687 (accessed June 30, 2024).

CBE/CSE style

WikiPatents contributors. 18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Jun 6, 02:21 UTC [cited 2024 Jun 30]. Available from: http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687.

Bluebook style

18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687 (last visited June 30, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687",
   note = "[Online; accessed 30-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18431346. REDUCING OXIDATION BY ETCHING SACRIFICIAL AND PROTECTION LAYER SEPARATELY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18431346._REDUCING_OXIDATION_BY_ETCHING_SACRIFICIAL_AND_PROTECTION_LAYER_SEPARATELY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=64687}",
   note = "[Online; accessed 30-June-2024]"
 }


Retrieved from "http://wikipatents.org/index.php?title=Special:CiteThisPage"