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Bibliographic details for 18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)

Citation styles for 18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)

APA style

18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION). (2024, June 6). WikiPatents, . Retrieved 07:30, June 27, 2024 from http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559.

MLA style

"18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)." WikiPatents, . 6 Jun 2024, 02:06 UTC. 27 Jun 2024, 07:30 <http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559>.

MHRA style

WikiPatents contributors, '18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)', WikiPatents, , 6 June 2024, 02:06 UTC, <http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559> [accessed 27 June 2024]

Chicago style

WikiPatents contributors, "18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)," WikiPatents, , http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559 (accessed June 27, 2024).

CBE/CSE style

WikiPatents contributors. 18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) [Internet]. WikiPatents, ; 2024 Jun 6, 02:06 UTC [cited 2024 Jun 27]. Available from: http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559.

Bluebook style

18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION), http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559 (last visited June 27, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559",
   note = "[Online; accessed 27-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18060544. BURIED OXIDE LAYER AND ETCH STOP LAYER PROCESS FOR DIRECT BACK SIDE CONTACT OF SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18060544._BURIED_OXIDE_LAYER_AND_ETCH_STOP_LAYER_PROCESS_FOR_DIRECT_BACK_SIDE_CONTACT_OF_SEMICONDUCTOR_DEVICE_simplified_abstract_(INTERNATIONAL_BUSINESS_MACHINES_CORPORATION)&oldid=64559}",
   note = "[Online; accessed 27-June-2024]"
 }


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