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Bibliographic details for 18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

Citation styles for 18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

APA style

18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, May 24). WikiPatents, . Retrieved 09:40, July 1, 2024 from http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282.

MLA style

"18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 24 May 2024, 07:10 UTC. 1 Jul 2024, 09:40 <http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282>.

MHRA style

WikiPatents contributors, '18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 24 May 2024, 07:10 UTC, <http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282> [accessed 1 July 2024]

Chicago style

WikiPatents contributors, "18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282 (accessed July 1, 2024).

CBE/CSE style

WikiPatents contributors. 18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 May 24, 07:10 UTC [cited 2024 Jul 1]. Available from: http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282.

Bluebook style

18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282 (last visited July 1, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282",
   note = "[Online; accessed 1-July-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18423648. DIELECTRIC PROTECTION LAYER IN MIDDLE-OF-LINE INTERCONNECT STRUCTURE MANUFACTURING METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18423648._DIELECTRIC_PROTECTION_LAYER_IN_MIDDLE-OF-LINE_INTERCONNECT_STRUCTURE_MANUFACTURING_METHOD_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61282}",
   note = "[Online; accessed 1-July-2024]"
 }


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