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Bibliographic details for 18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

Citation styles for 18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

APA style

18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, May 24). WikiPatents, . Retrieved 09:53, July 1, 2024 from http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273.

MLA style

"18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 24 May 2024, 07:09 UTC. 1 Jul 2024, 09:53 <http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273>.

MHRA style

WikiPatents contributors, '18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 24 May 2024, 07:09 UTC, <http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273> [accessed 1 July 2024]

Chicago style

WikiPatents contributors, "18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273 (accessed July 1, 2024).

CBE/CSE style

WikiPatents contributors. 18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 May 24, 07:09 UTC [cited 2024 Jul 1]. Available from: http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273.

Bluebook style

18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273 (last visited July 1, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273",
   note = "[Online; accessed 1-July-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18464243._DIRECT_WRITING_SYSTEM_USED_FOR_ELECTRON_BEAM_LITHOGRAPHY_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=61273}",
   note = "[Online; accessed 1-July-2024]"
 }


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