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Bibliographic details for 18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)

Citation styles for 18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)

APA style

18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.). (2024, May 24). WikiPatents, . Retrieved 07:46, June 26, 2024 from http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599.

MLA style

"18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)." WikiPatents, . 24 May 2024, 02:13 UTC. 26 Jun 2024, 07:46 <http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599>.

MHRA style

WikiPatents contributors, '18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)', WikiPatents, , 24 May 2024, 02:13 UTC, <http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599> [accessed 26 June 2024]

Chicago style

WikiPatents contributors, "18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599 (accessed June 26, 2024).

CBE/CSE style

WikiPatents contributors. 18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.) [Internet]. WikiPatents, ; 2024 May 24, 02:13 UTC [cited 2024 Jun 26]. Available from: http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599.

Bluebook style

18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.), http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599 (last visited June 26, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599",
   note = "[Online; accessed 26-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18347129._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=60599}",
   note = "[Online; accessed 26-June-2024]"
 }


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