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Bibliographic details for Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract
- Page name: Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 24 May 2024 00:54 UTC
- Date retrieved: 28 June 2024 22:11 UTC
- Permanent URL: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148
- Page Version ID: 60148
Citation styles for Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract
APA style
Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract. (2024, May 24). WikiPatents, . Retrieved 22:11, June 28, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148.
MLA style
"Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract." WikiPatents, . 24 May 2024, 00:54 UTC. 28 Jun 2024, 22:11 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148>.
MHRA style
WikiPatents contributors, 'Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract', WikiPatents, , 24 May 2024, 00:54 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148> [accessed 28 June 2024]
Chicago style
WikiPatents contributors, "Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148 (accessed June 28, 2024).
CBE/CSE style
WikiPatents contributors. Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract [Internet]. WikiPatents, ; 2024 May 24, 00:54 UTC [cited 2024 Jun 28]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148.
Bluebook style
Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148 (last visited June 28, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148",
note = "[Online; accessed 28-June-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "Taiwan semiconductor manufacturing co., ltd. (20240162083). BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES simplified abstract --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240162083)._BILAYER_SEAL_MATERIAL_FOR_AIR_GAPS_IN_SEMICONDUCTOR_DEVICES_simplified_abstract&oldid=60148}",
note = "[Online; accessed 28-June-2024]"
}
