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Bibliographic details for Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract

Citation styles for Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract

APA style

Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract. (2024, May 23). WikiPatents, . Retrieved 05:46, June 21, 2024 from http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514.

MLA style

"Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract." WikiPatents, . 23 May 2024, 02:49 UTC. 21 Jun 2024, 05:46 <http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514>.

MHRA style

WikiPatents contributors, 'Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract', WikiPatents, , 23 May 2024, 02:49 UTC, <http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514> [accessed 21 June 2024]

Chicago style

WikiPatents contributors, "Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514 (accessed June 21, 2024).

CBE/CSE style

WikiPatents contributors. Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract [Internet]. WikiPatents, ; 2024 May 23, 02:49 UTC [cited 2024 Jun 21]. Available from: http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514.

Bluebook style

Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract, http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514 (last visited June 21, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514",
   note = "[Online; accessed 21-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Samsung electronics co., ltd. (20240160115). OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240160115)._OVERLAY_CORRECTION_METHOD,_AND_EXPOSURE_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_INCLUDING_OVERLAY_CORRECTION_METHOD_simplified_abstract&oldid=59514}",
   note = "[Online; accessed 21-June-2024]"
 }


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